Controle das estruturas cristalinas e Anisotropias Magnéticas em filmes à base de Co e Gd

Detalhes bibliográficos
Ano de defesa: 2015
Autor(a) principal: Bertelli, Tiago Pulce
Orientador(a): Não Informado pela instituição
Banca de defesa: Não Informado pela instituição
Tipo de documento: Tese
Tipo de acesso: Acesso aberto
Idioma: por
Instituição de defesa: Universidade Federal do Espírito Santo
BR
Doutorado em Física
Centro de Ciências Exatas
UFES
Programa de Pós-Graduação em Física
Programa de Pós-Graduação: Não Informado pela instituição
Departamento: Não Informado pela instituição
País: Não Informado pela instituição
Palavras-chave em Português:
Link de acesso: http://repositorio.ufes.br/handle/10/7498
Resumo: In this work, we present a systematic investigation of the experimental parameters [inclination angle between the normal of the substrate plane and deposition flux direction a; angular velocity of the sample holder ?; magnetic field application during deposition HD; substrate temperature TS] on the values of the cubic HKC, uniaxial HKU and exchange bias HEB anisotropy of Co and Gd thin films, bilayers of Co/IrMn and IrMn/Gd and trilayers of Co/IrMn/Gd prepared by DC Magnetron Sputtering. Using the X-ray diffraction technique, it is demonstrated that, regardless the values of a, ? and HD parameters, Co films were deposited on the Ta seed layer oriented in the [111] direction with face centered cubic (fcc) structure. For the Gd films grown on the Ta seed layer, it was shown that as higher is the TS value, larger is the internal stress in Gd films; a feature that favors stabilization of the fcc-type phase for Gd thickness tGd of 10 nm. The increase of tGd or decrease of TS value causes structural relaxation to the hexagonal close packed hcp phase; it occurs on top of fcc-type Gd structure grown on Ta seed layer. Concerning the anisotropy fields (measured by ferromagnetic resonance technique FMR), it is demonstrated that due to the oblique deposition a ? 0°, one can control the HKU field of Co film. Specifically, for the Co film prepared at a = 55°, ? = 0 rpm and HD nulo, a maximum value of HKU = 72 Oe was obtained. It was possible to project samples with pure cubic or uniaxial and combined HKC + HKU fields by using oblique deposition for low a values (22 = a = 40°) with different rotation speeds ? (0, 30 and 40 rpm) of the sample holder during Co depositions. It was found that the HKC field remains approximately constant (? 2.8 Oe) regardless of a, ? and HD values, while the HKU field linearly decreases with the increasing of the angular velocity ? at a rate of 0.35 Oe/rpm (sample-holder central position: 15.7 = HKU = 1.4 Oe and sample-holder edge positions: 20.6 = HKU = 6.5 Oe for the range 0 = ? = 40 rpm, respectively). Using magnetometry measurements, it is shown that the fcc phase of Gd presents magnetization of 175 emu/cm3 and coercive field of 100 Oe, nearly constants in a wide temperature range (10 = T = 400 K), while the hcp Gd phase shows large coercive fields (HC = 480 Oe) and saturatation magnetization (MS = 640 emu/cm3 ) at 60 K, before spin reorientation phenomenon. Comparing Co/IrMn bylayers prepared with HD = 0 and HD ? 0 (applied to the film plane), it wasfound a significant increase of both uniaxial HKU (13 ? 33 Oe), and exchange bias HEB (33 ? 55 Oe) fields for samples located at the sample-holder central position. In addition, for bilayers samples fabricated at the sample-holder edge positions, the rotation of the xii sample enhances much more the HKU value (130%); an effect associated with the variation of a angle during the sample rotation. For Co/IrMn/Gd trilayers prepared at the sample-holder edges, the HKU field presents an anomalous increase (~ 45 ? ~ 220 Oe, 5 times bigger), accompanied by an increase of 45% in the HEB field related to the Co/IrMn interface (~ 55 ? ~ 80 Oe). This behavior may be due to the presence of ferromagnetic Gd deposited on top of texturized [111] IrMn layer. In fact, it diserves additional investigations since its physical origin is not yet understood.
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spelling Controle das estruturas cristalinas e Anisotropias Magnéticas em filmes à base de Co e GdExperimental parametersOblique depositionAngular velocityFerromagnetic resonanceParâmetros experimentaisÂngulo de deposiçãoVelocidade de rotaçãoRessonância ferromagnéticaFísicaIn this work, we present a systematic investigation of the experimental parameters [inclination angle between the normal of the substrate plane and deposition flux direction a; angular velocity of the sample holder ?; magnetic field application during deposition HD; substrate temperature TS] on the values of the cubic HKC, uniaxial HKU and exchange bias HEB anisotropy of Co and Gd thin films, bilayers of Co/IrMn and IrMn/Gd and trilayers of Co/IrMn/Gd prepared by DC Magnetron Sputtering. Using the X-ray diffraction technique, it is demonstrated that, regardless the values of a, ? and HD parameters, Co films were deposited on the Ta seed layer oriented in the [111] direction with face centered cubic (fcc) structure. For the Gd films grown on the Ta seed layer, it was shown that as higher is the TS value, larger is the internal stress in Gd films; a feature that favors stabilization of the fcc-type phase for Gd thickness tGd of 10 nm. The increase of tGd or decrease of TS value causes structural relaxation to the hexagonal close packed hcp phase; it occurs on top of fcc-type Gd structure grown on Ta seed layer. Concerning the anisotropy fields (measured by ferromagnetic resonance technique FMR), it is demonstrated that due to the oblique deposition a ? 0°, one can control the HKU field of Co film. Specifically, for the Co film prepared at a = 55°, ? = 0 rpm and HD nulo, a maximum value of HKU = 72 Oe was obtained. It was possible to project samples with pure cubic or uniaxial and combined HKC + HKU fields by using oblique deposition for low a values (22 = a = 40°) with different rotation speeds ? (0, 30 and 40 rpm) of the sample holder during Co depositions. It was found that the HKC field remains approximately constant (? 2.8 Oe) regardless of a, ? and HD values, while the HKU field linearly decreases with the increasing of the angular velocity ? at a rate of 0.35 Oe/rpm (sample-holder central position: 15.7 = HKU = 1.4 Oe and sample-holder edge positions: 20.6 = HKU = 6.5 Oe for the range 0 = ? = 40 rpm, respectively). Using magnetometry measurements, it is shown that the fcc phase of Gd presents magnetization of 175 emu/cm3 and coercive field of 100 Oe, nearly constants in a wide temperature range (10 = T = 400 K), while the hcp Gd phase shows large coercive fields (HC = 480 Oe) and saturatation magnetization (MS = 640 emu/cm3 ) at 60 K, before spin reorientation phenomenon. Comparing Co/IrMn bylayers prepared with HD = 0 and HD ? 0 (applied to the film plane), it wasfound a significant increase of both uniaxial HKU (13 ? 33 Oe), and exchange bias HEB (33 ? 55 Oe) fields for samples located at the sample-holder central position. In addition, for bilayers samples fabricated at the sample-holder edge positions, the rotation of the xii sample enhances much more the HKU value (130%); an effect associated with the variation of a angle during the sample rotation. For Co/IrMn/Gd trilayers prepared at the sample-holder edges, the HKU field presents an anomalous increase (~ 45 ? ~ 220 Oe, 5 times bigger), accompanied by an increase of 45% in the HEB field related to the Co/IrMn interface (~ 55 ? ~ 80 Oe). This behavior may be due to the presence of ferromagnetic Gd deposited on top of texturized [111] IrMn layer. In fact, it diserves additional investigations since its physical origin is not yet understood.Apresenta-se, neste trabalho, um estudo sistemático dos efeitos dos parâmetros experimentais [ângulo de deposição do feixe em relação ao substrato α (e/ou posição no substrato); velocidade de rotação do porta-substrato ω; campo magnético de deposição HD; temperatura do substrato TS] sobre os campos de anisotropias cúbica HKC, uniaxial HKU e de exchange bias HEB de filmes finos de Co e Gd, bicamadas de Co/IrMn e IrMn/Gd e tricamadas de Co/IrMn/Gd preparados pela técnica de magnetron sputtering. Usando a técnica de difração de raios-X, demonstrou-se que, independentemente dos valores dos parâmetros α, ω e HD, os filmes de Co crescem sobre a camada semente de Ta orientados na direção [111] com fase estrutural cúbica de face centrada fcc. Para os filmes de Gd, crescidos sobre o Ta, demonstrou-se que quanto maior o valor de TS maior a tensão interna na camada de Gd que, por sua vez, favorece a estabilização da fase fcc até a espessura de Gd tGd de 10 nm (anteriormente resultados da literatura reportavam valores de 4 nm). O aumento do valor de tGd ou a diminuição de TS provoca, nas camadas atômicas de Gd crescidas sobre o Ta, relaxação estrutural para a estrutura hexagonal compacta hcp. Com relação aos campos de anisotropias, obtidos pelas medidas de ressonância ferromagnética FMR, demonstrou-se que devido à deposição oblíqua α ≠ 0° pode-se controlar o campo de anisotropia uniaxial HKU do filme de Co, sendo que, para HD = 0, o máximo valor de HKU = 72 Oe para α = 55° e ω = 0 rpm. Combinando deposição oblíqua para valores baixos de α (22 ≤ α ≤ 40°) com diferentes velocidades de rotação ω (0, 30 e 40 rpm) do porta-substrato durante a deposição dos filmes de Co, controlam-se nas amostras anisotropias puramente cúbica HKC, puramente uniaxial HKU ou combinada HKC + HKU. Ainda dos resultados de FMR nos filmes de Co, demonstrou-se que o campo de anisotropia HKC ≅ 2,8 Oe permanece aproximadamente constante independentemente dos valores de α, ω e HD, enquanto que o campo de anisotropia HKU decresce linearmente com o aumento da velocidade de rotação ω a uma taxa de -0,35 Oe/rpm, (posição central: 15,7 ≥ HKU ≥ 1,4 Oe e extremidade do porta-substrato: 20,6 ≥ HKU ≥ 6,5 Oe, para o intervalo de 0 ≤ ω ≤ 40 rpm, respectivamente). Usando medidas de magnetometria, demonstrou-se que a fase fcc do Gd possui magnetização de 175 emu/cm3 e campo coercivo de 100 Oe, aproximadamente constantes em um amplo intervalo de temperatura (10 ≤ T ≤ 400 K), enquanto a fase hcp do Gd apresenta altos campo coercivo (HC = 480 Oe) e magnetização de saturação (MS = 640 emu/cm3). No caso das bicamadas Co/IrMn, verificou-se que a presença do campo de deposição HD (aplicado no plano do filme) aumenta significativamente o campo uniaxial HKU (13 → 33 Oe) e o de exchange bias HEB (33 → 55 Oe) quando preparam-se as amostras na posição central. Para os filmes produzidos nas extremidades do porta-substrato há um aumento ainda maior no valor de HKU (130%) devido à variação angular α durante a rotação do porta-amostra. Para as tricamadas, considerando também as amostras nas extremidades, o campo HKU sofre um aumento anômalo (~ 45 → ~ 220 Oe, 5 vezes), acompanhado por um aumento de 45% no valor do campo HEB (~ 55 → ~ 80 Oe) para a interface Co/IrMn, quando se cresce o Gd sobre a camada IrMn; fato ainda não compreendido.Universidade Federal do Espírito SantoBRDoutorado em FísicaCentro de Ciências ExatasUFESPrograma de Pós-Graduação em FísicaCaetano, Edson PassamaniLarica, CarlosPelegrini, FernandoPessoa, Marcio SolinoSommer, Rubem LuisBueno, Thiago Eduardo PedreiraBertelli, Tiago Pulce2018-08-01T22:30:03Z2018-08-012018-08-01T22:30:03Z2015-12-11info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/doctoralThesisTextapplication/pdfBERTELLI, Tiago Pulce. Controle das Estruturas Cristalinas e Anisotropias Magnéticas em Filmes à Base de Co e Gd. 2015. 131 p. Tese (Doutorado em Física) - Programa de Pós-Graduação em Física, Universidade Federal do Espírito Santo, Vitória, 2015.http://repositorio.ufes.br/handle/10/749853porinfo:eu-repo/semantics/openAccessreponame:Repositório Institucional da Universidade Federal do Espírito Santo (riUfes)instname:Universidade Federal do Espírito Santo (UFES)instacron:UFES2024-06-28T18:06:25Zoai:repositorio.ufes.br:10/7498Repositório InstitucionalPUBhttp://repositorio.ufes.br/oai/requestriufes@ufes.bropendoar:21082024-06-28T18:06:25Repositório Institucional da Universidade Federal do Espírito Santo (riUfes) - Universidade Federal do Espírito Santo (UFES)false
dc.title.none.fl_str_mv Controle das estruturas cristalinas e Anisotropias Magnéticas em filmes à base de Co e Gd
title Controle das estruturas cristalinas e Anisotropias Magnéticas em filmes à base de Co e Gd
spellingShingle Controle das estruturas cristalinas e Anisotropias Magnéticas em filmes à base de Co e Gd
Bertelli, Tiago Pulce
Experimental parameters
Oblique deposition
Angular velocity
Ferromagnetic resonance
Parâmetros experimentais
Ângulo de deposição
Velocidade de rotação
Ressonância ferromagnética
Física
title_short Controle das estruturas cristalinas e Anisotropias Magnéticas em filmes à base de Co e Gd
title_full Controle das estruturas cristalinas e Anisotropias Magnéticas em filmes à base de Co e Gd
title_fullStr Controle das estruturas cristalinas e Anisotropias Magnéticas em filmes à base de Co e Gd
title_full_unstemmed Controle das estruturas cristalinas e Anisotropias Magnéticas em filmes à base de Co e Gd
title_sort Controle das estruturas cristalinas e Anisotropias Magnéticas em filmes à base de Co e Gd
author Bertelli, Tiago Pulce
author_facet Bertelli, Tiago Pulce
author_role author
dc.contributor.none.fl_str_mv Caetano, Edson Passamani
Larica, Carlos
Pelegrini, Fernando
Pessoa, Marcio Solino
Sommer, Rubem Luis
Bueno, Thiago Eduardo Pedreira
dc.contributor.author.fl_str_mv Bertelli, Tiago Pulce
dc.subject.por.fl_str_mv Experimental parameters
Oblique deposition
Angular velocity
Ferromagnetic resonance
Parâmetros experimentais
Ângulo de deposição
Velocidade de rotação
Ressonância ferromagnética
Física
topic Experimental parameters
Oblique deposition
Angular velocity
Ferromagnetic resonance
Parâmetros experimentais
Ângulo de deposição
Velocidade de rotação
Ressonância ferromagnética
Física
description In this work, we present a systematic investigation of the experimental parameters [inclination angle between the normal of the substrate plane and deposition flux direction a; angular velocity of the sample holder ?; magnetic field application during deposition HD; substrate temperature TS] on the values of the cubic HKC, uniaxial HKU and exchange bias HEB anisotropy of Co and Gd thin films, bilayers of Co/IrMn and IrMn/Gd and trilayers of Co/IrMn/Gd prepared by DC Magnetron Sputtering. Using the X-ray diffraction technique, it is demonstrated that, regardless the values of a, ? and HD parameters, Co films were deposited on the Ta seed layer oriented in the [111] direction with face centered cubic (fcc) structure. For the Gd films grown on the Ta seed layer, it was shown that as higher is the TS value, larger is the internal stress in Gd films; a feature that favors stabilization of the fcc-type phase for Gd thickness tGd of 10 nm. The increase of tGd or decrease of TS value causes structural relaxation to the hexagonal close packed hcp phase; it occurs on top of fcc-type Gd structure grown on Ta seed layer. Concerning the anisotropy fields (measured by ferromagnetic resonance technique FMR), it is demonstrated that due to the oblique deposition a ? 0°, one can control the HKU field of Co film. Specifically, for the Co film prepared at a = 55°, ? = 0 rpm and HD nulo, a maximum value of HKU = 72 Oe was obtained. It was possible to project samples with pure cubic or uniaxial and combined HKC + HKU fields by using oblique deposition for low a values (22 = a = 40°) with different rotation speeds ? (0, 30 and 40 rpm) of the sample holder during Co depositions. It was found that the HKC field remains approximately constant (? 2.8 Oe) regardless of a, ? and HD values, while the HKU field linearly decreases with the increasing of the angular velocity ? at a rate of 0.35 Oe/rpm (sample-holder central position: 15.7 = HKU = 1.4 Oe and sample-holder edge positions: 20.6 = HKU = 6.5 Oe for the range 0 = ? = 40 rpm, respectively). Using magnetometry measurements, it is shown that the fcc phase of Gd presents magnetization of 175 emu/cm3 and coercive field of 100 Oe, nearly constants in a wide temperature range (10 = T = 400 K), while the hcp Gd phase shows large coercive fields (HC = 480 Oe) and saturatation magnetization (MS = 640 emu/cm3 ) at 60 K, before spin reorientation phenomenon. Comparing Co/IrMn bylayers prepared with HD = 0 and HD ? 0 (applied to the film plane), it wasfound a significant increase of both uniaxial HKU (13 ? 33 Oe), and exchange bias HEB (33 ? 55 Oe) fields for samples located at the sample-holder central position. In addition, for bilayers samples fabricated at the sample-holder edge positions, the rotation of the xii sample enhances much more the HKU value (130%); an effect associated with the variation of a angle during the sample rotation. For Co/IrMn/Gd trilayers prepared at the sample-holder edges, the HKU field presents an anomalous increase (~ 45 ? ~ 220 Oe, 5 times bigger), accompanied by an increase of 45% in the HEB field related to the Co/IrMn interface (~ 55 ? ~ 80 Oe). This behavior may be due to the presence of ferromagnetic Gd deposited on top of texturized [111] IrMn layer. In fact, it diserves additional investigations since its physical origin is not yet understood.
publishDate 2015
dc.date.none.fl_str_mv 2015-12-11
2018-08-01T22:30:03Z
2018-08-01
2018-08-01T22:30:03Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/doctoralThesis
format doctoralThesis
status_str publishedVersion
dc.identifier.uri.fl_str_mv BERTELLI, Tiago Pulce. Controle das Estruturas Cristalinas e Anisotropias Magnéticas em Filmes à Base de Co e Gd. 2015. 131 p. Tese (Doutorado em Física) - Programa de Pós-Graduação em Física, Universidade Federal do Espírito Santo, Vitória, 2015.
http://repositorio.ufes.br/handle/10/7498
53
identifier_str_mv BERTELLI, Tiago Pulce. Controle das Estruturas Cristalinas e Anisotropias Magnéticas em Filmes à Base de Co e Gd. 2015. 131 p. Tese (Doutorado em Física) - Programa de Pós-Graduação em Física, Universidade Federal do Espírito Santo, Vitória, 2015.
53
url http://repositorio.ufes.br/handle/10/7498
dc.language.iso.fl_str_mv por
language por
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
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dc.publisher.none.fl_str_mv Universidade Federal do Espírito Santo
BR
Doutorado em Física
Centro de Ciências Exatas
UFES
Programa de Pós-Graduação em Física
publisher.none.fl_str_mv Universidade Federal do Espírito Santo
BR
Doutorado em Física
Centro de Ciências Exatas
UFES
Programa de Pós-Graduação em Física
dc.source.none.fl_str_mv reponame:Repositório Institucional da Universidade Federal do Espírito Santo (riUfes)
instname:Universidade Federal do Espírito Santo (UFES)
instacron:UFES
instname_str Universidade Federal do Espírito Santo (UFES)
instacron_str UFES
institution UFES
reponame_str Repositório Institucional da Universidade Federal do Espírito Santo (riUfes)
collection Repositório Institucional da Universidade Federal do Espírito Santo (riUfes)
repository.name.fl_str_mv Repositório Institucional da Universidade Federal do Espírito Santo (riUfes) - Universidade Federal do Espírito Santo (UFES)
repository.mail.fl_str_mv riufes@ufes.br
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