Produção e caracterização de filmes finos de ZnO

• Ano de defesa: 2010
• Autor(a) principal: Silva, Luciane Janice Venturini da
• Tipo de documento: Dissertação
• Tipo de acesso: Acesso aberto
• dARK ID: ark:/26339/00130000027hm
• Idioma: por
• Instituição de defesa: Universidade Federal de Santa Maria; BR; Física; UFSM; Programa de Pós-Graduação em Física
• Palavras-chave em Português: Filmes finos de óxido condutor transparente; Óxido de zinco; Eletrodeposição; Células solares; Lei de Vegard; Thin films of transparent conducting oxide; Zinc oxide; Electrodeposition; Solar cells; Vegard s law; CNPQ::CIENCIAS EXATAS E DA TERRA::FISICA
• Link de acesso: http://repositorio.ufsm.br/handle/1/9210

Among the semiconducting oxides, ZnO has received considerable attention as a promising material for several applications in optoelectronic devices due to its high optical transparency in the visible range and good electrical conductivity achieved by doping with suitable elements. The present work, part developed in the Laboratório de Magnetismo e Materiais Magnéticos Nanoestruturados (UNIPAMPA/BAGÉ) and part in the Laboratório de Magnetismo e Materiais Magnéticos (UFSM), aimed mainly the development of an experimental procedure of ZnO thin films potentiostatic electrodeposition using 0.1 M aqueous solution of zinc nitrate seeking potential applications in solar cells. The electrodeposition technique is the growth of certain material on a solid substrate by electrochemical reactions and emerges as an alternative to traditional techniques (sputtering, sol-gel, spray pyrolysis) production of thin films. Besides being relatively easy to implement and has low production cost. The ZnO thin films were deposited on Au (111) substrates, obtained from commercial CD-Rs (CDtrodos). Voltammetry technique was used for the electrochemical processes involved analysis and to establish suitable areas of potential for films growth. ZnO deposits were characterized by X-ray diffraction and atomic force microscopy (AFM) techniques.